Fabrication and atomistic modeling of ion-etch nanostructures on substrates

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DOIResolve DOI: http://doi.org/10.1557/PROC-849-KK6.9
AuthorSearch for: ; Search for:
EditorSearch for: Gilmer, George H.; Search for: Huang, Hanchen; Search for: Wang, Enge
TypeArticle
Proceedings title2004 MRS Fall Meeting - Symposium KK – Kinetics-Driven Nanopatterning on Surfaces
Series titleMaterials Research Society Symposia Proceedings; no. 849
Conference2004 MRS Fall Meeting: Symposium KK: Kinetics-Driven Nanopatterning on Surfaces, November 29-December 3, 2004, Boston, Massachusetts, USA
ISSN0272-9172
ISBN9781558997974
1558997970
Article numberL9.11
Pages3540; # of pages: 6
AbstractWe have implemented and investigated numerically a new process to fabricate self-organized metal networks and lines on non-metallic substrates. We have deposited a thin film of Cu on silicon and glass substrates and etched the film by a 1 keV-energy Ar beam. Due to the kinetic mechanism known as sputter instability, nanosize metal patterns self-organize on the substrate at the stage when the etched surface reaches the metal/substrate interface. By numerical simulations, we have investigated the mechanism and control factors for the process.
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PublisherCambridge University Press
AffiliationNational Research Council Canada
Peer reviewedYes
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NRC number19
NPARC number12328314
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Record identifiera3ad38b8-c83d-49f8-98cf-8ba945494b44
Record created2009-09-10
Record modified2016-05-09
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