High-efficiency subwavelength-engineered surface grating couplers in SOI and DSOI

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DOIResolve DOI: http://doi.org/10.1109/Group4.2014.6962018
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TypeArticle
Proceedings titleIEEE International Conference on Group IV Photonics GFP
Conference11th International Conference on Group IV Photonics, GFP 2014, 27 August 2014 through 29 August 2014
ISSN1949-2081
ISBN9781479922833
Article number6962018
Pages4142; # of pages: 2
AbstractThe coupling efficiency of a surface grating coupler is optimized for a an arbitrary buried oxide thickness by adjusting the grating radiation angle. The coupler is apodized using a subwavelength structure, allowing a single etch step fabrication. The measured coupling loss is -2.16dB with 3dB bandwidth of 64nm, for a minimum feature size of 100nm. It is also shown by simulations that by implementing this coupler in a double SOI (DSOI) wafer, an ultra-low coupling loss of -0.42dB is achieved.
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PublisherIEEE
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); NRC Institute for Microstructural Sciences
Peer reviewedYes
NPARC number21275502
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Record identifiera53c553f-ad91-4602-b968-d32384f67f3b
Record created2015-07-14
Record modified2016-05-09
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