Photochemical Attachment of Organic Monolayers onto H-Terminated Si(111): Radical Chain Propagation Observed via STM Studies

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TypeArticle
Journal titleJ. Am. Chem. Soc
ISSN00027863
Volume126
Issue44
Pages1431814319; # of pages: 2
AbstractPhotochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required.
Publication date
Linkhttp://pubs3.acs.org/acs/journals/doilookup?in_doi=10.1021/ja045777x
AffiliationNational Research Council Canada; NRC Institute for National Measurement Standards; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
Identifier10072378
NPARC number12338707
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Record identifiera57077c2-dad8-4f9f-aafc-bd8960971079
Record created2009-09-10
Record modified2016-05-09
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