Reactive gas ion beam generation using single atom W(111) gas field ion sources

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DOIResolve DOI: http://doi.org/10.1017/S1431927616003937
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TypeArticle
Journal titleMicroscopy and Microanalysis
ISSN1431-9276
1435-8115
Volume22
IssueS3
Pages616617
AbstractThe scanning ion microscopy is gaining momentum as it provides several key advantages over scanning electron microscopy: (i) enhanced depth of focus, (ii) improved surface and element sensitivity, (iii) better lateral resolution, and (iv) nanomachining and milling. It uses different ions to achieve these tasks ranging from inert gases like helium and neon for imaging and ion milling. Other gases such as argon, nitrogen, and oxygen have potential for further sputtering and etching. It is therefore crucial that gas field ion sources provide necessary robustness and stability for range of various gases.
Publication date
LanguageEnglish
AffiliationNational Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NPARC number23001313
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Record identifierb1155f34-c5f9-4c74-b920-7491dec808ea
Record created2017-01-17
Record modified2017-01-17
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