Nano-dot markers for electron tomography formed by electron beam-induced deposition: Nanoparticle agglomerates application

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DOIResolve DOI: http://doi.org/10.1016/j.ultramic.2014.04.005
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TypeArticle
Journal titleUltramicroscopy
ISSN1879-2723
Volume144
Pages5057; # of pages: 8
SubjectElectron tomography; Nanoparticle agglomerate; Electron beam induced deposition; Fiducial marker; Nano-dot marker; FIB sample preparation
AbstractA method allowing fabrication of nano-dot markers for electron tomography was developed using an electron beam-induced deposition in an ordinary dual beam instrument (FIB and SEM) or an SEM. The electron beam deposited nano-dot markers are suitable for automatic alignment of tomographic series. The accuracy of the alignment was evaluated and the method was demonstrated on agglomerated nanoparticle samples using a rod-shaped sample with no missing wedge effect. Simulations were used to assess the effect of marker size on alignment accuracy. © 2014.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); Security and Disruptive Technologies; National Institute for Nanotechnology
Peer reviewedYes
NPARC number21272302
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Record identifierb161c1ff-d2ca-45cc-af96-71a3461312e9
Record created2014-07-24
Record modified2016-05-09
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