Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium

EditorSearch for: Sah, R. E.; Search for: Sundaram, K. B.; Search for: Deen, M. J.; Search for: Landheer, D.; Search for: Brown, W. D.; Search for: Misra, D.
Series titleProceedings (Electrochemical Society); Volume 2003-2
Conference7th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, 2003, Paris, France
Physical description684 p.
AbstractThe papers address a very wide range of fabrication and characterization techniques and applications of thin films for microelectronic devices. More specific topics address by the papers include: reliability, interface states, gate oxide studies, passivation, tunneling phenomena, and dielectric breakdown.
Publication date
PublisherElectrochemical Society
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12346596
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Record identifierb96cb513-68f1-4e8c-9633-ef87f63985ca
Record created2009-09-17
Record modified2016-05-09
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