Glancing angle deposition of crystalline zinc oxide nanorods

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Journal titleThin Solid Films
Pages35303537; # of pages: 8
SubjectZinc oxide; Crystal; Sputtering; Nanostructure; Thin film; Morphology; Kinetics; Nanorod
AbstractZinc oxide nanorod films produced by glancing angle deposition were fabricated within the parameter space defined by the process variables pitch (nanorod growth per substrate rotation), deposition rate, and throw distance to investigate the effect these parameters have on morphology and crystallinity. Statistical analysis was used to identify important relationships. Final film morphology depends on both pitch and deposition rate, where two growth regimes distinguished by deposition rate are observed and interpreted as arising from competition between geometric shadowing and crystalline growth kinetics. Optimal growth conditions for nanostructured films of isolated zinc oxide nanorods occurred for pitch values of approximately 1 nm to 10 nm. Pole-figure measurements confirm that the films consist of oriented single-crystal nanorods. Films deposited at all pitch values between 0.001 nm to 6.5 μm are crystalline and textured, and greater texturing is achieved for conditions of decreased surface diffusion. © 2011 Elsevier B.V. All rights reserved.
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AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology
Peer reviewedYes
NPARC number21271961
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Record identifierba410d5e-155f-414d-9153-d1151d9937cc
Record created2014-05-13
Record modified2016-05-09
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