Density doubling of block copolymer templated features

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DOIResolve DOI: http://doi.org/10.1021/nl203488a
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TypeArticle
Journal titleNano Letters
ISSN1530-6984
1530-6992
Volume12
Issue1
Pages264268
SubjectBlock copolymer; solvent anneal; self-assembly; density doubling; graphoepitaxy; thin films; nanolines
AbstractBlock copolymers can be used to template large arrays of nanopatterns with periodicities equal to the characteristic spacing of the polymer. Here we demonstrate a technique capitalizing on the multilayered arrangement of cylindrical domains to effectively double the pattern density templated by a given polymer. By controlling the initial thickness of the film and the solvent annealing conditions, it was possible to reproducibly create density doubled lines by swelling the film with solvent until bilayers of horizontal cylinders were obtained. This process was also demonstrated to be compatible with graphoepitaxy.
Publication date
LanguageEnglish
AffiliationNational Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NPARC number21268907
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Record identifierbc76c3bc-9257-45f5-bf7e-81ebba6942f8
Record created2013-11-25
Record modified2016-05-09
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