ELNES and EDS Maing in HfOxNy Thin Films and AlN/TiN Superlattices

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TypeArticle
ConferenceMicroscopy and Microanalysis 2004, August 1-5, 2004, Savannah, Georgia, USA
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12346697
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Record identifierbce7c3df-8385-4364-ab87-bfe79e8a7127
Record created2009-09-17
Record modified2016-05-09
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