Ultra-Thin Zirconium and Hafnium Silicate Films Deposited By MOCVD on Si100

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TypeArticle
ConferenceHigh-k Dielectrics Symposium
Volume2002-x
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedNo
NPARC number12346201
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Record identifierc21be32d-7d7b-4e23-bd19-25f2d0498e00
Record created2009-09-17
Record modified2016-05-09
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