Structure of Hafnium silicate films formed by atomic layer deposition

Download
  1. Get@NRC: Structure of Hafnium silicate films formed by atomic layer deposition (Opens in a new window)
DOIResolve DOI: http://doi.org/10.1149/1.3206616
AuthorSearch for: ; Search for: ; Search for: ; Search for:
TypeArticle
Journal titleECS Transactions
ISSN1938-5862
1938-6737
Volume25
Issue6
Pages163172; # of pages: 10
AbstractHf distributions in as-grown and annealed (HfO2)0.25(SiO2)0.75 films with thicknesses in the range 4-13 nm were investigated by high resolution transmission electron microscopy (HRTEM), angle resolved X-ray photoelectron spectroscopy (ARXPS) and medium energy ion scattering (MEIS). HRTEM images show a layered structure in films thinner than 8 nm. ARXPS data also show a non-uniform distribution of Hf throughout the film depth. A diffusion of SiO2 to the film surface after a longer time anneal was observed by MEIS. All these observations provide evidence for surface-directed spinodal decomposition in the pseudobinary (HfO2)x(SiO2)1-x alloy system.
Publication date
LanguageEnglish
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada
Peer reviewedYes
NPARC number21276871
Export citationExport as RIS
Report a correctionReport a correction
Record identifiercb2f666e-e529-4ec1-91b3-b0a0c3877302
Record created2015-10-27
Record modified2016-05-09
Bookmark and share
  • Share this page with Facebook (Opens in a new window)
  • Share this page with Twitter (Opens in a new window)
  • Share this page with Google+ (Opens in a new window)
  • Share this page with Delicious (Opens in a new window)