Low-dose performance of parallel-beam nanodiffraction

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DOIResolve DOI: http://doi.org/10.1016/j.ultramic.2008.07.004
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TypeArticle
Journal titleUltramicroscopy
ISSN0304-3991
Volume109
Issue1
Pages1421; # of pages: 8
Subjectelectron diffraction; low-dosemicroscopy; radiation damage; TEM imaging; phase contrast; nanoparticle
AbstractWeevaluatethelow-doseperformanceofparallelnano-beamdiffraction(NBD)inthetransmission electron microscopeasamethodforcharacterizingradiationsensitivematerialsatlowelectron irradiation dose.Acriterion,analogoustoRose’s,isestablishedfordetectingadiffractionspotwith desired signal-to-noiseratio.Ourexperimentaldatashowthatadosesubstantiallylowerthaninhigh- resolution bright-fieldimagingissufficienttodeterminestructureandorientationofindividual nanoscaleobjectsembeddedinamorphousmatrix.Inaninstrumentequippedwithacoldfield- emissiongunitispossibletoformaprobewithsub-3nmdiameterandsub-0.3mradconvergenceangle with sufficientbeamcurrenttorecordadiffractionpatternwithlessthan0.2sacquisitiontime.The interpretationofNBDpatternsisidenticaltothatofselectedareadiffractionpatterns.Weillustratethe physicalprinciplesunderlyinggoodlow-doseperformanceofNBDbymeansofaphasegrating.The electron irradiationdoseneededtodetectadiffractionpeakinNBDisfoundproportionalto1/N2, where N is thenumberoflatticeplanescontributingtothepeak.
Publication date
PublisherElsevier
LanguageEnglish
AffiliationNational Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NPARC number21268180
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Record identifierd2de9766-196b-4ab4-923c-279f6919d442
Record created2013-05-21
Record modified2016-05-09
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