Electron beam deposited Nb-doped TiO2 toward nanostructured transparent conductive thin films

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DOIResolve DOI: http://doi.org/10.1016/j.tsf.2012.10.075
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TypeArticle
Journal titleThin Solid Films
ISSN00406090
Volume525
Pages2834; # of pages: 7
SubjectNb-doped TiO2; Transparent conducting oxides; Doped oxides; Evaporation; Glancing angle deposition; Sol–gel; Thin film
AbstractNb-doped TiO2 (TNO) has been widely explored as an alternative transparent conductor. TNO thin films have been fabricated by various deposition methods, and here we demonstrate fabrication by evaporation of sol–gel synthesized TNO source material. A range of NbxTi1 − xO2 (x = 0, 0.03, 0.06, 0.12, 0.24) compositions were synthesized, pressed into pellets, and deposited as thin films via electron beam evaporation. The thin films were characterized for composition by energy dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy and for crystallinity by X-ray diffraction for the different Nb contents explored. Transparency, conductivity, and Haacke transparent conductor figure of merit values are reported for the evaporated TNO films as a function of Nb content, substrate heating temperature, and post deposition annealing conditions. Glancing angle deposition (GLAD) is used to demonstrate nanostructuring of evaporated TNO based on physical shadowing. Nanostructured GLAD TNO films of increased morphological complexity can be produced using this method, and could lead to unique transparent conductor device architectures.
Publication date
LanguageEnglish
AffiliationSecurity and Disruptive Technologies; National Research Council Canada
Peer reviewedYes
IdentifierS0040609012013454
NPARC number21268746
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Record identifierd53204fa-1b48-47ee-b919-370cafb37189
Record created2013-11-12
Record modified2016-05-09
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