Femtosecond laser nanomachining initiated by ultraviolet multiphoton ionization

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DOIResolve DOI: http://doi.org/10.1364/OE.21.024185
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TypeArticle
Journal titleOptics Express
ISSN1094-4087
Volume21
Issue20
Pages2418524190; # of pages: 6
SubjectCombined pulse; Damage features; Damage threshold; Multiphoton ionization; Nanomachining; Near-infrared; Rate-equation models; Shorter wavelength; Fused silica; Photoionization; Ultrafast lasers; Ultrashort pulses
AbstractWe report on the experimental results of 300 nm features generated on fused silica using a near-infrared (IR) femtosecond laser pulse initiated by an ultraviolet (UV) pulse. With both pulses at a short (~60 fs) delay, the damage threshold of the UV pulse is only 10% of its normal value. Considerable reduction of UV damage threshold is observed when two pulses are at ± 1.3 ps delay. The damage feature size of the combined pulses is similar to that of a single UV pulse. A modified rate equation model with the consideration of defect states is used to help explain these results. This concept can be applied to shorter wavelengths, e.g. XUV and X-ray, with the required fluence below their normal threshold.
Publication date
LanguageEnglish
AffiliationSecurity and Disruptive Technologies; National Research Council Canada
Peer reviewedYes
NPARC number21270345
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Record identifierd7d1ea1c-bbeb-4e1c-90ef-e5928c4d224c
Record created2014-01-31
Record modified2016-05-09
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