In situ reflectance measurements of soft-x-ray/extreme-ultraviolet Mo/Y multilayer mirrors

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DOIResolve DOI: http://doi.org/10.1364/OL.20.001450
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TypeArticle
Journal titleOptics Letters
Volume20
Issue12
Pages14501452; # of pages: 3
AbstractWith a new ultrahigh-vacuum deposition/ref lectometer system, Mo/Y multilayer mirrors were deposited by dc-magnetron sputtering and characterized in situ with synchrotron radiation. The Mo/Y multilayer mirrors, measured before exposure to air, had near-normal-incidence reflectances as high as 46% at wavelengths near 11.4 nm. After several days of exposure these samples typically had a relative reflectance loss of ~10% as a result of oxidation of the top Mo layer. The best Mo/Y multilayers were fabricated with base pressures below the low 10-9 Torr range and after a bakeout to reduce water vapor in the chamber.
Publication date
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12327606
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Record identifierdb41f240-b509-4f74-9d85-1c892f7ab8f9
Record created2009-09-10
Record modified2016-05-09
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