Low temperature epitaxy of Si/Si1-xGex heterostructures using a commercially available UHV-CVD reactor

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TypeArticle
Journal titlePhysics in Canada
ISSN0031-9147
Volume52
IssueSeptember/October 5
Pages241245; # of pages: 5
Publication date
LanguageEnglish
AffiliationNRC Institute for National Measurement Standards; National Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
Identifier10039600
NRC number1176
NPARC number8897868
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Record identifierdd8719ea-7dbb-4f2a-aae4-637ee875490b
Record created2009-04-22
Record modified2016-05-09
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