Synthesis and characterization of calixarene derivatives as resist materials fo electron-beam lithography

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TypeArticle
Journal titleJournal of Vacuum Science and Technology B
Volume24
Issue1
Pages26770; # of pages: 198
Publication date
AffiliationNRC National Institute for Nanotechnology; National Research Council Canada
Peer reviewedYes
NRC number174
NPARC number8926407
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Record identifierdfdaeb24-e614-418b-a22d-25b7ede46230
Record created2009-04-23
Record modified2016-05-09
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