Writing strategies of circular gratings for surface-emitting lasers using focused-ion-beam (x-y coordinate) and electron-beam (polar coordinate) lithography

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DOIResolve DOI: http://doi.org/10.1116/1.587627
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TypeArticle
Journal titleJournal of Vacuum Science & Technology B
Volume12
Issue6
Pages36263630; # of pages: 5
AbstractIn this article the fabrication of circular gratings by electron-beam lithography (r-θ coordinates) and by focused ion-beam lithography (x-y coordinate) is presented. The differences between the two techniques, relevant to the fabrication of circular patterns, are described. The optimum writing strategies and the quality of circular gratings are compared. Electrically pumped circular-grating surface-emitting distributed Bragg reflector (DBR) lasers were fabricated by the two techniques. Room temperature cw operation of a circular-grating surface-emitting DBR laser is demonstrated.
Publication date
LanguageEnglish
AffiliationNational Research Council Canada; NRC Institute for Microstructural Sciences
Peer reviewedNo
NPARC number12328195
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Record identifiere73da5e6-b2d2-44af-8fa1-93ee473c28b2
Record created2009-09-10
Record modified2016-05-09
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