Trimming phase and birefringence errors in planar lightwave circuits with deep ultraviolet femtosecond laser

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DOIResolve DOI: http://doi.org/10.1049/el:20045975
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TypeArticle
Journal titleElectronics Letters
ISSN0013-5194
Volume40
Issue19
Pages11791181; # of pages: 3
SubjectKrF excimer laser; SiO2; birefringence errors; deep ultraviolet femtosecond laser; hydrogen free Mach-Zehnder planar waveguide circuit; planar lightwave circuits; refractive index; silica waveguies; trimming phase errors; ultraviolet photosensitivity;
AbstractA deep ultraviolet femtosecond laser was employed to trim phase and birefringence errors in silica planar lightwave circuits. A permanent refractive index change of ∼3.8×10-4 and a birefringence change of 1.0×10-4 were induced in hydrogen-free Mach-Zehnder planar waveguide circuits. The ultrafast laser enhances the ultraviolet photosensitivity response in silica waveguides by two orders of magnitude greater than that of a nanosecond 248 nm KrF excimer laser.
Publication date
LanguageEnglish
AffiliationNRC Industrial Materials Institute; National Research Council Canada
Peer reviewedYes
NPARC number21272506
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Record identifierea453f9f-d732-4029-afc6-ba1f369f1e0c
Record created2014-12-01
Record modified2016-05-09
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