Lateral diffusion of titanium disilicide as a route to contacting hybrid Si/organic nanostructures

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DOIResolve DOI: http://doi.org/10.1063/1.1519959
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TypeArticle
Journal titleApplied Physics Letters
Volume81
Issue19
Pages36363638; # of pages: 3
SubjectATOMIC FORCE MICROSCOPY; NANOSTRUCTURES (DEVICES); NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTORS (MATERIALS); SOLID-SOLID INTERFACES; SURFACE DIFFUSION; TITANIUM COMPOUNDS; TRANSPORT PROPERTIES
AbstractWe characterized microscopic patterns of TiSi2 using atomic force microscopy and scanning tunneling microscopy, to test the possibility of using silicide contacts for experiments on the nanoscopic scale. We observed the effect on the morphology of incomplete formation of the disilicide, and studied the growth of lateral extension due to atomic diffusion. Upon diffusion, the silicide forms a neat and clean interface some hundreds of nanometers from the bulk electrode. That spreading phenomenon is our central focus, as we believe it may be useful in future efforts to make narrowly spaced contacts.
Publication date
LanguageEnglish
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; NRC Steacie Institute for Molecular Sciences
Peer reviewedNo
NPARC number12336490
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Record identifierecad768d-9f68-4fed-8612-4f6075c8f762
Record created2009-09-10
Record modified2016-05-09
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