Drastic Ion-implantation-induced intermixing during annealing of self-assembled InAs/InP (100) Quantum Dots

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DOIResolve DOI: http://doi.org/10.1088/0957-4484/18/1/015404
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TypeArticle
Journal titleNanotechnology
Volume18
Issue1
Pages015404
Publication date
AffiliationNRC Institute for Microstructural Sciences; National Research Council Canada; Executive Offices
Peer reviewedNo
NPARC number12744833
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Record identifierf4ebb1e3-365e-4164-9bee-cfc182ffd6a4
Record created2009-10-27
Record modified2016-05-09
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