Fully automated hot embossing processes utilizing high resolution working stamps

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DOIResolve DOI: http://doi.org/10.1016/j.mee.2009.11.098
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TypeArticle
Journal titleMicroelectronic Engineering
ISSN0167-9317
1873-5568
Volume87
Pages10371040
Subjecthot embossing; soft working stamps; de-embossing; spin-on layer; high resolution
AbstractNanoimprint lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometer down to few nanometers range. This paper describes the technology for imprinting of polymer substrates as well as spin-on polymers by using soft working stamp materials. A fully automated hot embossing system, the EVG®750 was built to use this rapid replication processes. By utilizing soft working stamps, we demonstrate the possibility to replicate, in fully automated mode, both high-aspect ratio features in thermoplastic materials as needed for microfluidic lab-on-chip applications as well as high resolution features down to 50 nm in polymer that can be used as templates for pattern transfer in the fabrication of plasmonic substrates for bio-sensing applications.
Publication date
PublisherElsevier
LanguageEnglish
AffiliationNational Research Council Canada; NRC Industrial Materials Institute
Peer reviewedYes
NPARC number23002043
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Record identifier40c53f07-bc23-4a48-9d1e-bf6ce6176d07
Record created2017-07-27
Record modified2017-07-27
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