5 years of ambient pressure photoelectron spectroscopy (APPES) at the Swiss Light Source (SLS)

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DOIResolve DOI: http://doi.org/10.1016/j.elspec.2017.01.003
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TypeArticle
Journal titleJournal of Electron Spectroscopy and Related Phenomena
ISSN0368-2048
Volume216
Pages116
SubjectX-ray photoelectron spectroscopy (XPS); near edge X-ray absorption fine structure (NEXAFS); liquid microjet; in situ spectroscopy; electrical double layer; surface potential
AbstractIn March of 2012 an endstation dedicated to ambient pressure photoelectron spectroscopy (APPES) was installed at the Swiss Light Source (SLS) synchrotron radiation facility on the campus of the Paul Scherrer Institute (PSI). The endstation is mobile and operated at the vacuum ultraviolet (VUV), Surfaces/Interfaces: Microscopy (SIM) and Phoenix beamlines, which together afford a nearly continuous photon energy range from 5−8000 eV. This broad energy range is by far the widest available to a single currently operational APPES endstation. During its first five years of operation this endstation has been used to address challenging fundamental problems in the areas of soft-matter colloidal nanoscience, environmental science and energy storage—research that encompasses the liquid-nanoparticle, liquid-vapor (or vacuum) and solid-vapor interfaces. Here we present select highlights of these results and offer an outlook to the next five years of APPES research at the SLS.
Publication date
PublisherElsevier
LanguageEnglish
AffiliationMeasurement Science and Standards; National Research Council Canada
Peer reviewedYes
NPARC number23002556
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Record identifier742f3a3d-3629-4ed3-9bdd-f25d3cae5b86
Record created2017-11-30
Record modified2017-11-30
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